Research topics
Eperimental methods
Theoretical methods
Nanostructures and metallic quantum wells are grown in an UHV (Ultra High Vacuum) conditions by atom vapor deposition with help of selfassembling and epitaxy processes on atomically clean, well oriented crystalline Si surfaces. Metallic atomic chains are produced on vicinal Si surfaces.
Electrical conductivity of metallic quantum wells is since long time our research topic. Our laboratory is one of few in the world where galvanomagnetic properties of the metallic quantum wells are studied. Measurements are performed in UHV environment at low temperatures starting from about 3K.
To study details of electron band structure of surface nanostructures we use electron photoemission (ARPES) methods. The UHV MICROPROBE (OMICRON) system is equipped with UV lamp (SPECS) capable producing of intense polarized light with quanta energy of 21.2 eV. Electron energy and momentum distribution is measured with hemispherical analyzer PHOIBOS 150 (SPECS) with a micro-channel plate (MCP) detector. Attached Mott detector allows performing spin-resolved photoemission measurements.
Atomic chains on the silicon surface. Image from a scanning tunneling microscope.
Crystal surface structure and its reconstructions upon sub-monolayer metal deposition are investigated with STM and RHEED techniques. The microscope allows performing measurements of the sample kept from helium temperatures up to several hundreds K. Atomic resolution of the microscope allows trace single atoms and the STM spectroscopic working mode gives insight into electronic nature of the sample. The STM VT (OMICRON) together with RHEED apparatus form powerful instrument for study of electronic and structural properties of nanostructures.